Date of Graduation
1999
Document Type
Thesis
Degree Type
MS
College
Statler College of Engineering and Mineral Resources
Department
Chemical and Biomedical Engineering
Committee Chair
Charter D. Stinespring
Committee Member
John W. Zondlo
Committee Member
Rakesh K. Gupta
Abstract
Atomic force and scanning tunneling microscopes have been used to characterize the microstructure and electron emission properties of diamond films grown on Si(100). In particular, we have focussed on the evolution of these film characteristics as diamond and SiC nucleate on Si(100) at 800°C by reaction with C2H4 gas under 5x10-5torr pressure. Under these conditions, there is possibly a brief period of 2-D layer-by-layer growth, but there is a tendency for the film to rapidly convert to a 3-D growth mode marked by the persistence of small primary nuclei ~400-600Å wide and ~5-6 lattice steps high. The in-air electron emission characteristics of these films gave work function values in the 0.2–0.42eV range, typical of those reported in literature. The results suggest a novel single crystal diamond growth technique by optimizing the conversion layer formed during the initial stages of growth.
Recommended Citation
Tolani, Vikram Lilo, "Microstructure and electron emission characterization of the initial stages of diamond growth on silicon(100)." (1999). Graduate Theses, Dissertations, and Problem Reports. 10427.
https://researchrepository.wvu.edu/etd/10427